High thermoelectric performance in high crystallinity epitaxial Si films containing silicide nanodots with low thermal conductivity-Reference-Cited by-同舟云学术

High thermoelectric performance in high crystallinity epitaxial Si films containing silicide nanodots with low thermal conductivity

Author:

Sakane Shunya¹,Ishibe Takafumi¹,Hinakawa Takahiro¹,Naruse Nobuyasu²^ORCID,Mera Yutaka²,Mahfuz Alam Md.³,Sawano Kentarou³,Nakamura Yoshiaki¹

Affiliation:

1. Graduate School of Engineering Science, Osaka University, 1-3 Machikaneyama-cho, Toyonaka, Osaka 560-8531, Japan

2. Department of Fundamental Bioscience, Shiga University of Medical Science, Tsukinowa-cho, Seta, Otsu, Shiga 520-2202, Japan

3. Advanced Research Laboratories, Tokyo City University, 8-15-1 Todoroki, Setagaya, Tokyo 158-0082, Japan

Funder

Japan Society for the Promotion of Science

Core Research for Evolutional Science and Technology

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

Reference40 articles.

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