A new plasma potential measurement instrument for plasma ion sources
Author:
Affiliation:
1. Department of Physics, Accelerator Laboratory, University of Jyväskylä, P.O. Box 35, FIN-40014, University of Jyväskylä, Finland
Publisher
AIP Publishing
Subject
Instrumentation
Reference15 articles.
1. R. Geller, Electron Cyclotron Resonance Ion Sources and ECR Plasmas (Institute of Physics, London, 1996), ISBN 0740301074.
2. D. Hitz, G. Melin, M. Pontonnier, and T.K. Nguyen, Proceedings of the 11th International Workshop on ECR Ion Sources ( 1993), p. 91.
3. Metal ion beams from an ECR ion source using volatile compounds
4. Ion plasma sputtering as a method of introducing solid material into an electron cyclotron resonance ion source
5. Techniques and mechanisms applied in electron cyclotron resonance sources for highly charged ions
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