Reconfigurable phase-change photomask for grayscale photolithography-Reference-Cited by-同舟云学术

Reconfigurable phase-change photomask for grayscale photolithography

Published:2017-05-15 Issue:20 Volume:110 Page:201110
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Wang Q.¹^ORCID,Yuan G. H.²,Kiang K. S.³^ORCID,Sun K.³,Gholipour B.⁴,Rogers E. T. F.⁴⁵,Huang K.¹,Ang S. S.¹,Zheludev N. I.²⁴,Teng J. H.¹

Affiliation:

1. Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis, Singapore 138634, Singapore

2. TPI and Centre for Disruptive Photonic Technologies, Nanyang Technological University, Singapore 637371, Singapore

3. Southampton Nanofabrication Centre, Faculty of Physical Sciences and Engineering, University of Southampton, Southampton SO17 1BJ, United Kingdom

4. Optoelectronics Research Centre and Centre for Photonic Metamaterials, University of Southampton, Highfield, Southampton SO17 1BJ, United Kingdom

5. Instiute for Life Sciences, University of Southampton, Highfield, Southampton SO17 1BJ, United Kingdom

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4983198

Reference25 articles.

1. Gray-tone lithography using an optical diffuser and a contact aligner

2. Simulation and Process Design of Gray-Tone Lithography for the Fabrication of Arbitrarily Shaped Surfaces

3. Gray-scale photolithography using microfluidic photomasks

4. Grayscale lithography by a polymer photomask doped with laser dye

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