Patterning Sub-50 nm features with near-field embedded-amplitude masks
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1495538
Reference11 articles.
1. Imaging the irradiance distribution in the optical near field
2. Light-coupling masks for lensless, sub-wavelength optical lithography
3. Sub-diffraction-limited patterning using evanescent near-field optical lithography
4. Patterning 100 nm features using deep-ultraviolet contact photolithography
5. Numerical feasibility study of the fabrication of subwavelength structure by mask lithography
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