β-Gallium oxide power electronics

Author:

Green Andrew J.1ORCID,Speck James2,Xing Grace3,Moens Peter4,Allerstam Fredrik4,Gumaelius Krister4,Neyer Thomas4,Arias-Purdue Andrea5,Mehrotra Vivek5,Kuramata Akito6,Sasaki Kohei6ORCID,Watanabe Shinya6,Koshi Kimiyoshi6,Blevins John1ORCID,Bierwagen Oliver7ORCID,Krishnamoorthy Sriram2ORCID,Leedy Kevin1ORCID,Arehart Aaron R.8ORCID,Neal Adam T.1ORCID,Mou Shin1ORCID,Ringel Steven A.8ORCID,Kumar Avinash9ORCID,Sharma Ankit9ORCID,Ghosh Krishnendu9ORCID,Singisetti Uttam9ORCID,Li Wenshen2ORCID,Chabak Kelson1,Liddy Kyle1ORCID,Islam Ahmad1ORCID,Rajan Siddharth8,Graham Samuel10ORCID,Choi Sukwon11ORCID,Cheng Zhe12ORCID,Higashiwaki Masataka13ORCID

Affiliation:

1. Air Force Research Laboratory, Wright Patterson Air Force Base, Ohio 45433, USA

2. University of California, Santa Barbara, California 93106, USA

3. Cornell University, Ithaca, New York 14850, USA

4. ON Semiconductor, Oudenaarde 9700, Belgium

5. Teledyne, Thousand Oaks, California 91360, USA

6. Novel Crystal Technology, Inc., Tokyo 100-0005, Japan

7. Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund, Berlin 10117, Germany

8. Ohio State University, Columbus, Ohio 43210, USA

9. University at Buffalo, Buffalo, New York 14260, USA

10. Georgia Institute of Technology, Atlanta, Georgia 30332, USA

11. Penn State University, State College, Pennsylvania 16802, USA

12. University of Illinois, Urbana-Champaign, Illinois 61801, USA

13. National Institute of Information and Communications Technology, Tokyo 184-8795, Japan

Funder

Air Force Office of Scientific Research

Publisher

AIP Publishing

Subject

General Engineering,General Materials Science

Reference209 articles.

1. Market Reports, Status of the Power Electronics Industry, 2017.

2. N. E. Posthuma, S. You, S. Stoffels, D. Wellekens, H. Liang, M. Zhao, B. de Jaeger, K. Geens, N. Ronchi, S. Decoutere, P. Moens, A. Banerjee, H. Ziad, and M. Tack, in 2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD) (IEEE, 2018), pp. 284–287.

3. H. W. Then, C. Y. Huang, B. Krist, K. Jun, K. Lin, N. Nidhi, T. Michaelos, B. Mueller, R. Paul, J. Peck, W. Rachmady, S. Dasgupta, D. Staines, T. Talukdar, N. Thomas, T. Tronic, P. Fischer, W. Hafez, M. Radosavljevic, P. Agababov, I. Ban, R. Bristol, M. Chandhok, S. Chouksey, and B. Holybee, in 2019 IEEE International Electron Devices Meeting (IEDM) (IEEE, 2019), pp. 17.3.1–17.3.4.

4. H. Umezawa, in 2020 IEEE International Electron Devices Meeting (IEEE, 2020), pp. 5.6.1–5.6.4.

5. Gallium Oxide

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