Thermal characterization of thin films: A chip-based approach for in-plane property analysis

Author:

Wang Hanfu1ORCID,Liang Ziqi2ORCID,Tang Junhui2ORCID,Wang Dongwei1ORCID,Xu Bo1,Guo Lingju134ORCID,Guo Yanjun1ORCID,Chu Weiguo1ORCID

Affiliation:

1. CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, CAS Center of Excellence for Nanoscience, National Center for Nanoscience and Technology 1 , Beijing 100190, China

2. Department of Materials Science, Fudan University 2 , Shanghai 200433, China

3. Laboratory of Theoretical and Computational Nanoscience, CAS Center of Excellence for Nanoscience, National Center for Nanoscience and Technology 3 , Beijing 100190, China

4. University of Chinese Academy of Sciences 4 , Beijing 100049, China

Abstract

Accurate measurement of thermal properties in thin films is crucial for optimizing devices and deepening our understanding of heat transfer at nano and micro scales. This study presents a combined experimental and computational investigation on a chip-integrated technique for the assessment of in-plane thermal properties of thin films. This method stands out by incorporating inherent error cancelation to lessen the impact of radiative heat loss and allows simultaneous, independent determination of both thermal conductivity and diffusivity through straightforward linear fittings from the same dataset, reducing error propagation. We examine an 84 nm thick SiNx membrane over a temperature range from 100 K to nearly 500 K, aligning with previous studies. Further investigations into a conducting polymer film post-doping demonstrate a notable increase in both thermal conductivity and diffusivity, corroborating scanning thermal microscopy observations, confirming the technique's efficacy and reliability.

Funder

State Key Development Program for Basic Research of China

Publisher

AIP Publishing

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