Density functional theory study on the impact of heavy doping on Si intrinsic point defect properties and implications for single crystal growth from a melt
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4825222
Reference52 articles.
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3. Influence of boron concentration on the oxidation-induced stacking fault ring in Czochralski silicon crystals
4. OISF Pattern and Grown-in Precipitates in Heavily Boron Doped Silicon
5. K. Nakamura, R. Suewaka, T. Saishoji, and J. Tomioka, in Proceedings of the Forum on the Science and Technology of Silicon Materials 2003, 2003, p.161 and references therein.
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