Cathodoluminescence investigation of defect states in n- and p-type AlN

Abstract

State-of-the-art semiconducting aluminum nitride (AlN) films were characterized by cathodoluminescence (CL) spectroscopy in the range of 200–500 nm in an attempt to identify the energy levels within the bandgap and their associated defects. Near-band edge emission (around 206 nm) and high-intensity peaks centered in the near UV range (around 325 nm) are observed for both n- and p-type AlN films. The near UV peaks are potentially associated with oxygen contamination in the films. The p-type AlN films contain at least two unidentified peaks above 400 nm. Assuming that the dopant concentration is independent of compensation (i.e., in the perfect doping limit), three effective donor states are found from Fermi–Dirac statistics for Si-doped AlN, at ∼0.035, ∼0.05, and ∼0.11 eV. Similarly, a single effective acceptor energy of ∼0.03–0.05 eV (depending on the degeneracy factory considered) was found for Be doped AlN. CL investigation of doped AlN films supports claims that AlN may be a promising optoelectronic material, but also points to contaminant mitigation and defect theory as major areas for future study.