High power N-face GaN high electron mobility transistors grown by molecular beam epitaxy with optimization of AlN nucleation
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3130228
Reference23 articles.
1. N-polar GaN∕AlGaN∕GaN high electron mobility transistors
2. N-Face Metal–Insulator–Semiconductor High-Electron-Mobility Transistors With AlN Back-Barrier
3. Low nonalloyed Ohmic contact resistance to nitride high electron mobility transistors using N-face growth
4. Molecular beam epitaxy growth of GaN on C-terminated 6H–SiC (0001¯) surface
5. Dislocation scattering in a two-dimensional electron gas
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1. Surface morphology evolution of N-polar GaN on SiC for HEMT heterostructures grown by plasma-assisted molecular beam epitaxy;Journal of Physics D: Applied Physics;2023-05-19
2. The deformation mechanism of gallium-faces and nitrogen-faces gallium nitride during nanogrinding;International Journal of Mechanical Sciences;2022-01
3. Adsorption of nitrogen at AlN(000-1) surface – Decisive role of structural and electronic factors;Surface Science;2021-11
4. Source of two-dimensional electron gas in unintentionally doped AlGaN/GaN multichannel high-electron-mobility transistor heterostructures;Applied Physics Letters;2021-03-22
5. N-polar III-nitride transistors;III-Nitride Electronic Devices;2019
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