Effects of secondary and thermionic electron emission on the collector and source sheaths of a finite ion temperature plasma using kinetic theory and numerical simulation
Author:
Publisher
AIP Publishing
Subject
Fluid Flow and Transfer Processes,General Physics and Astronomy,Mechanics of Materials,Condensed Matter Physics,Computational Mechanics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.860495
Reference12 articles.
1. Transport code calculations concerning the plasma parameters in the scrape-off layer of poloidal limiter and the possible advantage of high Z wall materials in the cool plasma blanket approach
2. Collector and source sheaths of a finite ion temperature plasma
3. Electric sheath and presheath in a collisionless, finite ion temperature plasma
4. Heat flow through a Langmuir sheath in the presence of electron emission
5. Plasma sheath transmission factors for tokamak edge plasmas
Cited by 114 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Energy-dependent implementation of secondary electron emission models in continuum kinetic sheath simulations;Plasma Sources Science and Technology;2024-03-01
2. Modified Bohm Criterion and Sheath Characteristics in Nonextensive Electronegative Collisional Warm Plasma With Electron Emitting Surfaces;IEEE Transactions on Plasma Science;2024
3. The influence of sample temperature on SEM contrast of two types of nanostructures;Applied Physics A;2023-12-22
4. On the polytropic coefficient of negative ions for modeling the sheath and presheath of electronegative plasmas;Journal of Applied Physics;2023-08-16
5. Thermionic emission of a tungsten surface in high heat flux plasma: PIC simulations;Physics of Plasmas;2023-08-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3