Technique for determining concentration profiles of boron impurities in substrates
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1661816
Reference13 articles.
1. Discovery of anomalous base regions in transistors
2. Boron atom distributions in ion‐implanted silicon by the (n,4He) nuclear reaction
3. Stopping Cross Sections for 0.3‐ to 1.7‐MeV Helium Ions in Silicon and Silicon Dioxide
4. Range and stopping-power tables for heavy ions
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