Author:
Lozovoy K.,Voytsekhovskiy A.,Kokhanenko A.,Satdarov V.,Pchelyakov O.,Nikiforov A.
Abstract
AbstractIn this paper an analysis of tendencies of Ge on Si quantum dots nanoheterostructures’ usage in different optoelectronic devices such as, for example, solar cells and photodetectors of visible and infra-red regions is carried out; a complex mathematical model for calculation of dependency on growth conditions of self-organized quantum dots of Ge on Si grown using the method of molecular beam epitaxy parameters is described. Ways of segregation effect and underlying layers’ influence are considered. It is shown that for realization of good device characteristics quantum dots should have high density, small sizes, uniformity, and narrow size distribution function. The desirable parameters of arrays of square and rectangular quantum dots for device application are attainable under certain growth conditions.
Subject
Electrical and Electronic Engineering,Radiation,General Materials Science
Reference15 articles.
1. Photoelectric characteristics of PtSi Si Schottky barrier with boron heavily doped nanolayer SPIE;Voitsekhovskii;Proc,2001
2. dot ) heterojunction phototransistor for efficient light detection at μm;Elving;Physica E,2003
3. gtländer Silicon germanium nanostructures with quantum dots : Formation mechanisms and electrical properties;Pchelyakov;Semiconductors,2000
4. The history and future of semiconductor he terostructures;Alferov;Semiconductors,1998
5. Classification of Ge hut clusters in arrays formed by molecular beam epitaxy at low temperatures on the Si surface;Arapkina;Physics Uspekhi,2010
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