Interplay between Point and Extended Defects and Their Effects on Jerky Domain-Wall Motion in Ferroelectric Thin Films

Author:

Bulanadi Ralph1ORCID,Cordero-Edwards Kumara1ORCID,Tückmantel Philippe1,Saremi Sahar2,Morpurgo Giacomo1ORCID,Zhang Qi3ORCID,Martin Lane W.2455,Nagarajan Valanoor3,Paruch Patrycja1ORCID

Affiliation:

1. University of Geneva

2. University of California

3. University of New South Wales

4. Lawrence Berkeley National Laboratory

5. Rice University

Abstract

Defects have a significant influence on the polarization and electromechanical properties of ferroelectric materials. Statistically, they can be seen as random pinning centers acting on an elastic manifold, slowing domain-wall propagation and raising the energy required to switch polarization. Here we show that the “dressing” of defects can lead to unprecedented control of domain-wall dynamics. We engineer defects of two different dimensionalities in ferroelectric oxide thin films—point defects externally induced via He2+ bombardment, and extended quasi-one-dimensional a domains formed in response to internal strains. The a domains act as extended strong pinning sites (as expected) imposing highly localized directional constraints. Surprisingly, the induced point defects in the He2+ bombarded samples orient and align to impose further directional pinning, screening the effect of a domains. This defect interplay produces more uniform and predictable domain-wall dynamics. Such engineered interactions between defects are crucial for advancements in ferroelectric devices. Published by the American Physical Society 2024

Funder

Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung

National Science Foundation

Army Research Office

Centre of Excellence in Future Low-Energy Electronics Technologies, Australian Research Council

Publisher

American Physical Society (APS)

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