A high-performance TiO<sub>2</sub> protective layer derived from non-high vacuum technology for a Si-based photocathode to enhance photoelectrochemical water splitting-Reference-Cited by-同舟云学术

A high-performance TiO₂ protective layer derived from non-high vacuum technology for a Si-based photocathode to enhance photoelectrochemical water splitting

Published:2024 Issue:27 Volume:12 Page:16605-16616
ISSN:2050-7488
Container-title:Journal of Materials Chemistry A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Li Xin¹,Zhao Hui¹,Huang Jie¹,Li Ying¹,Miao Hongyan¹,Shi Gang¹^ORCID,Wong Po Keung²^ORCID

Affiliation:

1. The Key Laboratory of Synthetic and Biotechnology Colloids, Ministry of Education, School of Chemical and Material Engineering, Jiangnan University, Wuxi 214122, China

2. School of Life Sciences, The Chinese University of Hong Kong, Shatin, NT, Hong Kong, SAR, China

Abstract

A non-high vacuum technique was used to fabricate a TiO2 protective layer of a Si-based photocathode, in which MOF derivatives enhance carrier transfer efficiency. The photocathode has high onset potential, high photocurrent and long-term stability.

Funder

National Natural Science Foundation of China

Fok Ying Tung Education Foundation

Jiangnan University

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/TA/D4TA02398F

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