Extreme ultraviolet plasma spectroscopy of a pseudospark XUV source
Author:
Affiliation:
1. Swiss Federal Laboratories for Materials Science and Technology
2. 8600 Dübendorf
3. Switzerland
4. Department of Chemistry
5. University of Zurich
Abstract
The development of extreme ultraviolet (XUV) sources for tabletop operation has enabled a range of new applications in nano-structuring and spectroscopy.
Publisher
Royal Society of Chemistry (RSC)
Subject
Spectroscopy,Analytical Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2020/JA/D0JA00215A
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