Electrical and thermal conduction in ultra-thin freestanding atomic layer deposited W nanobridges-Reference-Cited by-同舟云学术

Electrical and thermal conduction in ultra-thin freestanding atomic layer deposited W nanobridges

Author:

Eigenfeld Nathan T.¹²³,Gertsch Jonas C.⁴²⁵,Skidmore George D.⁶⁷⁸,George Steven M.¹²³⁴²,Bright Victor M.¹²³

Affiliation:

1. Department of Mechanical Engineering

2. University of Colorado at Boulder

3. Boulder, USA

4. Department of Chemistry and Biochemistry and Department of Mechanical Engineering

5. 215 UCB Boulder, USA

6. DRS Technologies Inc.

7. Network and Imaging Systems DRS ITS Texas Site

8. Dallas, USA

Abstract

Electro/thermal conduction is reduced substantially in ultra-thin ALD W films. Evidence of phonon conduction appears in fabricated W structures.

Funder

Army Research Office

Defense Advanced Research Projects Agency

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

Reference35 articles.

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