A simple approach to the fabrication of fluorine-doped zinc oxide thin films by atomic layer deposition at low temperatures and an investigation into the growth mode-Reference-Cited by-同舟云学术

A simple approach to the fabrication of fluorine-doped zinc oxide thin films by atomic layer deposition at low temperatures and an investigation into the growth mode

Published:2014 Issue:1 Volume:2 Page:98-108
ISSN:2050-7526
Container-title:J. Mater. Chem. C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Choi Yong-June,Park Hyung-Ho

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2014/TC/C3TC31478B

Reference36 articles.

1. Transparent Conducting Oxides

2. Transparent Conducting Oxides for Photovoltaics

3. Improved Performance of Organic Light-Emitting Diodes Fabricated on Al-Doped ZnO Anodes Incorporating a Homogeneous Al-Doped ZnO Buffer Layer Grown by Atomic Layer Deposition

4. Structural and Electrical Properties of Atomic Layer Deposited Al-Doped ZnO Films

5. Investigation of Ga Substitution in ZnO Powder and Opto-Electronic Properties

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