Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials-Reference-Cited by-同舟云学术

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Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials

Published:2015-02-17 Issue:1 Volume:5 Page:
ISSN:2045-2322
Container-title:Scientific Reports
language:en
Short-container-title:Sci Rep

Author:

Wang Xiao-Dong,Chen Bo,Wang Hai-Feng,He Fei,Zheng Xin,He Ling-Ping,Chen Bin,Liu Shi-Jie,Cui Zhong-Xu,Yang Xiao-Hu,Li Yun-Peng

Publisher

Springer Science and Business Media LLC

Subject

Multidisciplinary

Link

http://www.nature.com/articles/srep08503.pdf

Reference29 articles.

1. Zukic, M., Torr, D. G., Kim, J., Spann, J. F. & Torr, M. R. Filters for the International Solar Terrestrial Physics Mission far-ultraviolet imager. Opt. Eng. 32, 3069–3074 (1993).

2. Torr, M. R. et al. A far ultraviolet imager for the International Solar-Terrestrial Physics Mission. Space Sci. Rev. 71, 329–383 (1995).

3. Mende, S. B. et al. Far ultraviolet imaging from the image spacecraft. 2. wideband FUV imaging. Space Sci. Rev. 91, 271–285 (2000).

4. Zukic, M. & Torr, D. G. Multiple reflectors as narrow-band and broadband vacuum ultraviolet filters. Appl. Opt. 31, 1588–1596 (1992).

5. Zukic, M., Torr, D. G., Spann, J. F. & Torr, M. R. Vacuum ultraviolet thin films. 1: optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2 and SiO2 . Appl. Opt. 29, 4284–4292 (1990).

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