Influence of Alkalinity and Steric Hindrance of Lewis-Base Catalysts on Atomic Layer Deposition of SiO2-Reference-Cited by-同舟云学术

Influence of Alkalinity and Steric Hindrance of Lewis-Base Catalysts on Atomic Layer Deposition of SiO2

Published:2011-11-04 Issue:47 Volume:115 Page:23363-23373
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Chen Shuang¹²,Fang Guoyong¹,Qian Xu²,Li Aidong²,Ma Jing¹

Affiliation:

1. Institute of Theoretical and Computational Chemistry, Key Laboratory of Mesoscopic Chemistry of MOE, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing, 210093, People's Republic of China

2. Department of Materials Science and Engineering, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing, 210093, People's Republic of China

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp2048663

Reference35 articles.

1. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

2. Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition

3. Atomic Layer Deposition: An Overview

4. Atomic layer growth of SiO2 on Si(100) using SiCl4 and H2O in a binary reaction sequence

5. Atomic layer controlled growth of SiO2 films using binary reaction sequence chemistry

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