Additive Lithography–Organic Monolayer Patterning Coupled with an Area-Selective Deposition-Reference-Cited by-同舟云学术

Additive Lithography–Organic Monolayer Patterning Coupled with an Area-Selective Deposition

Published:2021-01-20 Issue:7 Volume:13 Page:9081-9090
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Wojtecki Rudy¹^ORCID,Ma Jonathan²,Cordova Isvar²^ORCID,Arellano Noel¹,Lionti Krystelle¹,Magbitang Teddie¹,Pattison Thomas G.³^ORCID,Zhao Xiao⁴⁵^ORCID,Delenia Eugene¹,Lanzillo Nicholas⁶,Hess Alexander E.¹,Nathel Noah Fine¹,Bui Holt¹,Rettner Charles¹,Wallraff Gregory¹,Naulleau Patrick²

Affiliation:

1. International Business Machines−Almaden Research Center, 650 Harry Road, San Jose, California 95110, United States

2. Center for X-ray Optics, Materials Science Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd., Berkeley, California 94720, United States

3. Polymer Science Group, Department of Chemical Engineering, The University of Melbourne, Parkville, Victoria 3010, Australia

4. Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States

5. Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, California 94720, United States

6. International Business Machines−Semiconductor Technology Research, 257 Fuller Road, Albany, New York 12203, United States

Funder

International Business Machines Corporation

Australian Government

University of Melbourne

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.0c16817

Reference64 articles.

1. A Review of Patterned Organic Bioelectronic Materials and their Biomedical Applications

2. Highly Photoluminescent Carbon Dots for Multicolor Patterning, Sensors, and Bioimaging

3. Technologies for Printing Sensors and Electronics Over Large Flexible Substrates: A Review

4. Direct Patterning of Oriented Metal-Organic Framework Crystals via Control over Crystallization Kinetics in Clear Precursor Solutions

5. EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100

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