Nanoscale Patterning by UV Nanoimprint Lithography Using an Organometallic Resist-Reference-Cited by-同舟云学术

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Nanoscale Patterning by UV Nanoimprint Lithography Using an Organometallic Resist

Published:2009-10-23 Issue:11 Volume:1 Page:2645-2650
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Acikgoz Canet¹,Vratzov Boris¹,Hempenius Mark A.¹,Vancso G. Julius¹,Huskens Jurriaan¹

Affiliation:

1. Molecular Nanofabrication Group and Materials Science and Technology of Polymers, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands, and NT&D - Nanotechnology and Devices, 52062 Aachen, Germany

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/am9005379

Reference29 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Imprint Lithography with 25-Nanometer Resolution

3. Fabrication of nanostructures using a UV-based imprint technique

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