Fabrication of Sub-3 nm Feature Size Based on Block Copolymer Self-Assembly for Next-Generation Nanolithography-Reference-Cited by-同舟云学术

Fabrication of Sub-3 nm Feature Size Based on Block Copolymer Self-Assembly for Next-Generation Nanolithography

Published:2017-08-16 Issue:17 Volume:50 Page:6813-6818
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Kwak Jongheon¹,Mishra Avnish Kumar¹,Lee Jaeyong¹,Lee Kyu Seong¹,Choi Chungryong¹,Maiti Sandip¹,Kim Mooseong¹,Kim Jin Kon¹^ORCID

Affiliation:

1. National Creative Research Initiative Center for Smart Block Copolymers, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, Republic of Korea

Funder

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.7b00945

Reference63 articles.

1. Block Copolymer Thin Films: Physics and Applications

2. Directing the self-assembly of block copolymers

3. Self-assembled block copolymers: Bulk to thin film

4. Ordering in thin films of block copolymers: Fundamentals to potential applications

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