Directly Photopatternable Polythiophene as Dual-Tone Photoresist
Author:
Affiliation:
1. Department of Chemistry, Tufts University, 62 Talbot Avenue, Medford, Massachusetts 02155, United States
Funder
Arnold and Mabel Beckman Foundation
Division of Materials Research
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
http://pubs.acs.org/doi/pdf/10.1021/acs.macromol.7b01208
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