Directed Self-Assembly of Binary AB/AB Diblock Copolymer Blends for Dense Nanopatterns with Density Multiplication-Reference-Cited by-同舟云学术

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Directed Self-Assembly of Binary AB/AB Diblock Copolymer Blends for Dense Nanopatterns with Density Multiplication

Published:2024-05-15 Issue:10 Volume:57 Page:4878-4888
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Zhang Zhengyi¹,Li Luyang¹^ORCID,Song Qingliang¹,Peng Li²,Huang Xianbo²,Li Weihua¹^ORCID

Affiliation:

1. State Key Laboratory of Molecular Engineering of Polymers, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University, Shanghai 200433, China

2. National-Certified Enterprise Technology Center, Kingfa Science and Technology Co., Ltd., Science City, Guangzhou 510663, China

Funder

National Natural Science Foundation of China

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.4c00293

Reference66 articles.

1. Origins of Complex Self-Assembly in Block Copolymers

2. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter

3. Dense arrays of ordered GaAs nanostructures by selective area growth on substrates patterned by block copolymer lithography

4. The influence of molecular weight on nanoporous polymer films

5. Asymmetric Block Copolymers with Homopolymers: Routes to Multiple Length Scale Nanostructures

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