AFM Study of Roughness Development during ToF-SIMS Depth Profiling of Multilayers with a Cs+ Ion Beam in a H2 Atmosphere
Author:
Affiliation:
1. Jožef Stefan Institute, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
2. Jožef Stefan International Postgraduate School, Jamova Cesta 39, SI-1000 Ljubljana, Slovenia
Funder
Javna Agencija za Raziskovalno Dejavnost RS
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.2c01837
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1. Compositional depth profiling by sputtering
2. Comparison of depth profiling techniques using ion sputtering from the practical point of view
3. Alternative model multilayer structures for depth profiling studies
4. Identification of the Chemical Bonding Prompting Adhesion of a-C:H Thin Films on Ferrous Alloy Intermediated by a SiCx:H Buffer Layer
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