Simultaneous Writing and Erasing Using Probe Lithography Synchronized Erasing and Deposition (PLiSED)-Reference-Cited by-同舟云学术

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Simultaneous Writing and Erasing Using Probe Lithography Synchronized Erasing and Deposition (PLiSED)

Published:2022-10-06 Issue:41 Volume:38 Page:12630-12643
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Jiao Kexin¹,Becerra-Mora Nathalie¹,Russell Brice²,Migone Aldo²,Gemeinhardt Max E.¹,Goodson Boyd M.¹³^ORCID,Kohli Punit¹^ORCID

Affiliation:

1. School of Chemical and Biomolecular Sciences, Southern Illinois University, Carbondale, Illinois 62901, United States

2. School of Physics and Applied Physics, Southern Illinois University, Carbondale, Illinois 62901, United States

3. Materials Technology Center, Southern Illinois University, Carbondale, Illinois 62901, United States

Funder

National Institute of General Medical Sciences

National Science Foundation

Gowers fellowship

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.langmuir.2c02096

Reference54 articles.

1. "Dip-Pen" Nanolithography

2. Apertureless Cantilever-Free Pen Arrays for Scanning Photochemical Printing

3. Construction of 3D Polymer Brushes by Dip-Pen Nanodisplacement Lithography: Understanding the Molecular Displacement for Ultrafine and High-Speed Patterning

4. Multiplexed Protein Arrays Enabled by Polymer Pen Lithography: Addressing the Inking Challenge

5. Beam pen lithography as a new tool for spatially controlled photochemistry, and its utilization in the synthesis of multivalent glycan arrays

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