Photopolymerization of Self-Assembled Monolayers of Diacetylenic Alkylphosphonic Acids on Group-III Nitride Substrates-Reference-Cited by-同舟云学术

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Photopolymerization of Self-Assembled Monolayers of Diacetylenic Alkylphosphonic Acids on Group-III Nitride Substrates

Published:2010-06-04 Issue:13 Volume:26 Page:10725-10730
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Li Feng¹,Shishkin Evgeniy¹,Mastro Michael A.²,Hite Jennifer K.²,Eddy Charles R.²,Edgar J. H.³,Ito Takashi¹

Affiliation:

1. Department of Chemistry, Kansas State University, 213 CBC Building, Manhattan, Kansas 66506-0401

2. Code 6880, U.S. Naval Research Laboratory, 4555 Overlook Avenue, SW, Washington, D.C. 20375

3. Department of Chemical Engineering, Kansas State University, Durland Hall, Manhattan, Kansas 66506-5102

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la100273q

Reference55 articles.

1. AlxGa1–xN—A New Material System for Biosensors

2. Novel semiconductor materials for the development of chemical sensors and biosensors: A review

3. Recent advances in wide bandgap semiconductor biological and gas sensors

4. pH response of GaN surfaces and its application for pH-sensitive field-effect transistors

5. Anion Selective Potentiometric Sensor Based on Gallium Nitride Crystalline Membrane

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