Nanoscale Lithography on Monolayer Graphene Using Hydrogenation and Oxidation-Reference-Cited by-同舟云学术

Nanoscale Lithography on Monolayer Graphene Using Hydrogenation and Oxidation

Published:2011-07-26 Issue:8 Volume:5 Page:6417-6424
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Byun Ik-Su¹,Yoon Duhee²,Choi Jin Sik¹,Hwang Inrok¹,Lee Duk Hyun¹,Lee Mi Jung¹,Kawai Tomoji¹³,Son Young-Woo⁴,Jia Quanxi¹⁵,Cheong Hyeonsik²,Park Bae Ho¹

Affiliation:

1. Division of Quantum Phases & Devices, Department of Physics, Konkuk University, Seoul 143-701, Korea

2. Department of Physics, Sogang University, Seoul 121-742, Korea

3. The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan

4. Korea Institute for Advanced Study, Seoul 130-722, Korea

5. Center for Integrated Nanotechnologies, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, United States

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn201601m

Reference34 articles.

1. Bandgap opening in graphene induced by patterned hydrogen adsorption

2. Energy Gaps in Graphene Nanoribbons

3. Origin of the energy bandgap in epitaxial graphene

4. Graphene Oxidation: Thickness-Dependent Etching and Strong Chemical Doping

5. Control of Graphene's Properties by Reversible Hydrogenation: Evidence for Graphane

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