Role of Surface Chemistry in Semiconductor Thin Film Processing-Reference-Cited by-同舟云学术

Role of Surface Chemistry in Semiconductor Thin Film Processing

Published:1996-01-01 Issue:4 Volume:96 Page:1499-1518
ISSN:0009-2665
Container-title:Chemical Reviews
language:en
Short-container-title:Chem. Rev.

Author:

Ekerdt J. G.¹,Sun Y.-M.¹,Szabo A.¹,Szulczewski G. J.¹,White J. M.¹

Affiliation:

1. Departments of Chemical Engineering and of Chemistry and Biochemistry, Center for Materials Chemistry, and Center for Synthesis, Growth, and Analysis of Electronic Materials, University of Texas at Austin, Austin, Texas 78712

Publisher

American Chemical Society (ACS)

Subject

General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cr950236z

Reference210 articles.

1. Surface stoichiometry variation associated with GaAs (001) reconstruction transitions

2. Reflectance-difference spectroscopy of (001) GaAs surfaces in ultrahigh vacuum

3. Mechanisms of GaAs atomic layer epitaxy: a review of progress

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