Ordered Block-Copolymer Assembly Using Nanoimprint Lithography-Reference-Cited by-同舟云学术

Ordered Block-Copolymer Assembly Using Nanoimprint Lithography

Published:2004-08-13 Issue:9 Volume:4 Page:1633-1636
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Li Hong-Wei¹,Huck Wilhelm T. S.¹

Affiliation:

1. The Nanoscience Centre, Interdisciplinary Research Collaboration in Nanotechnology, University of Cambridge, 11 J. J. Thomson Avenue, CB3 0FF, UK, and Melville Laboratory for Polymer Synthesis, Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge, CB2 1EW, UK

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl049209r

Reference22 articles.

1. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter

2. Nanostructure fabrication using block copolymers

3. Precise Control of Nanopore Size in Thin Film Using Mixtures of Asymmetric Block Copolymer and Homopolymer

4. Local Control of Microdomain Orientation in Diblock Copolymer Thin Films with Electric Fields

5. Nanoscopic Templates from Oriented Block Copolymer Films

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