Chemical amplification mechanisms for microlithography-Reference-Cited by-同舟云学术

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Chemical amplification mechanisms for microlithography

Published:1991-05-01 Issue:3 Volume:3 Page:394-407
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Reichmanis E.,Houlihan F. M.,Nalamasu O.,Neenan T. X.

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm00015a009

Cited by 243 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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4. The use of a sulfonium-based photoacid generator in thiol–ene photopolymers for the controlled activation of transesterification through chemical amplification;Polymer Chemistry;2024

5. Iodonium functionalized polystyrene as non-chemically amplified resists for electron beam and extreme ultraviolet lithography;RSC Applied Polymers;2024

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