Direct Chemical Vapor Deposition Growth of WS2 Atomic Layers on Hexagonal Boron Nitride
Author:
Affiliation:
1. Department of Chemistry, Nagoya University, Nagoya 464-8602, Japan
2. National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
3. NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan
Funder
Ministry of Education, Culture, Sports, Science, and Technology
Nagoya University
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn503093k
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5. Coupled Spin and Valley Physics in Monolayers ofMoS2and Other Group-VI Dichalcogenides
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