In Situ Observation of Two-Dimensional Electron Gas Creation at the Interface of an Atomic Layer-Deposited Al2O3/TiO2 Thin-Film Heterostructure

Author:

Seok Tae Jun1,Liu Yuhang1,Choi Ji Hyeon1,Kim Hye Ju2,Kim Dae Hyun3,Kim Sung Min2,Jang Jae Hyuck4ORCID,Cho Deok-Yong5ORCID,Lee Sang Woon2ORCID,Park Tae Joo13ORCID

Affiliation:

1. Department of Materials Science & Chemical Engineering, Hanyang University, Ansan 15588, Korea

2. Department of Energy Systems Research and Department of Physics, Ajou University, Suwon 16499, Korea

3. Department of Advanced Materials Engineering, Hanyang University, Ansan 15588, Korea

4. Center for Research Equipment, Korea Basic Science Institute, Daejeon 34133, Korea

5. IPIT and Department of Physics, Jeonbuk National University, Jeonju 54896, Korea

Funder

Samsung

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

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