Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches-Reference-Cited by-同舟云学术

Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches

Published:2021-06-10 Issue:12 Volume:33 Page:4435-4444
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Nguyen Chi Thang¹^ORCID,Gu Bonwook¹,Cheon Taehoon²³,Park Jeongwoo⁴,Khan Mohammad Rizwan¹,Kim Soo-Hyun²^ORCID,Shong Bonggeun⁴^ORCID,Lee Han-Bo-Ram¹^ORCID

Affiliation:

1. Department of Materials Science and Engineering, Incheon National University, Incheon 22012, Korea

2. School of Materials Science and Engineering, Yeungnam University, Gyeongsan 712-749, Korea

3. Center for Core Research Facilities, Daegu Gyeongbuk Institute of Science & Technology, Daegu 711-873, Korea

4. Department of Chemical Engineering, Hongik University, Seoul 04066, Korea

Funder

Korea Semiconductor Research Consortium

Ministry of Trade, Industry and Energy

Incheon National University

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.1c00508

Reference44 articles.

1. Anomalous layer thickness dependent thermal conductivity of Td-WTe2 through first-principles calculation

2. Enhancement of dielectric constant in HfO2 thin films by the addition of Al2O3

3. Defect and grain boundary scattering in tungsten: A combined theoretical and experimental study

4. Stabilization of Tetragonal HfO2 under Low Active Oxygen Source Environment in Atomic Layer Deposition

5. Film growth model of atomic layer deposition for multicomponent thin films

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mechanistically Informed Strategies for Site-Selective Atomic Layer Deposition;Chemistry of Materials;2024-09-13

2. Atomic layer deposition of multicomponent amorphous oxide semiconductors with sequential dosing of metal precursors;Materials Letters;2024-05

3. Review of Material Properties of Oxide Semiconductor Thin Films Grown by Atomic Layer Deposition for Next-Generation 3D Dynamic Random-Access Memory Devices;Chemistry of Materials;2024-02-26

4. Area-Selective Deposition of Ruthenium Using Homometallic Precursor Inhibitor;Chemistry of Materials;2023-07-03

5. Growth characteristics and properties of RuAlO hybrid films fabricated by atomic layer deposition;Applied Surface Science;2023-01