Application of Polysilanes to LSI Manufacturing ProcessesTheir Antireflective Properties and Etching Selectivity toward Resists-Reference-Cited by-同舟云学术

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Application of Polysilanes to LSI Manufacturing ProcessesTheir Antireflective Properties and Etching Selectivity toward Resists

Published:2001-05-18 Issue:6 Volume:13 Page:2186-2194
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Hayase S.,Nakano Y.,S.Yoshikawa, and ,Ohta H.,Sato Y.,Shiobara E.,Miyoshi S.,Onishi Y.,Abe M.,Matsuyama H.,Ohiwa Y.

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/cm010099o

Reference63 articles.

1. Polysilane high polymers

2. Miller, R. D.; Rabolt, J. F.; Sooriyakumaran, R.; Fleming, W.; Fickes, G. N.; Farmer, B. L.; Kuzmany, H. InInorganic and OrganometallicPolymers; Zeldin, M., Wynne, K. L., Allcock, H. R., Eds.; ACS Symposium Series 360; American Chemical Society: Washington, DC, 1988; p 43.

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