Plasma-Enhanced Atomic Layer Deposition of Titanium Oxynitride (TiOxNy) Thin Films and Their Neuromorphic Applications-Reference-Cited by-同舟云学术

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Plasma-Enhanced Atomic Layer Deposition of Titanium Oxynitride (TiO_xN_y) Thin Films and Their Neuromorphic Applications

Published:2024-01-02 Issue:1 Volume:6 Page:319-329
ISSN:2637-6113
Container-title:ACS Applied Electronic Materials
language:en
Short-container-title:ACS Appl. Electron. Mater.

Author:

Annamalai Soundararaj¹,Dayal Gopalakrishnan¹^ORCID,Gondhalekar Jayesh¹^ORCID,Jinesh Kochupurackal B.¹^ORCID

Affiliation:

1. Electronic Materials and Devices Laboratory (EMERALD), Department of Physics, Indian Institute of Space-Science and Technology (IIST), Thiruvananthapuram, Kerala 695547, India

Funder

Department of Science and Technology, Ministry of Science and Technology, India

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Electrochemistry,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acsaelm.3c01343

Reference53 articles.

1. Do we have brain to spare?

2. Cell Biology of Synaptic Plasticity

3. Intrinsic and Task-Evoked Network Architectures of the Human Brain

4. Building the Human Brain

5. A Low Energy Oxide-Based Electronic Synaptic Device for Neuromorphic Visual Systems with Tolerance to Device Variation

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