New Insight into the Metal-Catalyst-Free Direct Chemical Vapor Deposition Growth of Graphene on Silicon Substrates-Reference-Cited by-同舟云学术

New Insight into the Metal-Catalyst-Free Direct Chemical Vapor Deposition Growth of Graphene on Silicon Substrates

Published:2021-01-19 Issue:3 Volume:125 Page:1774-1783
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Khan Afzal¹^ORCID,Habib Mohammad Rezwan²,Jingkun Cong¹,Xu Mingsheng²^ORCID,Yang Deren¹,Yu Xuegong¹^ORCID

Affiliation:

1. State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China

2. State Key Laboratory of Silicon Materials, College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, P. R. China

Funder

National Science Foundation of China

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.0c07457

Reference40 articles.

1. Wafer-Scale Growth of Single-Crystal Monolayer Graphene on Reusable Hydrogen-Terminated Germanium

2. Mechanism of non-metal catalytic growth of graphene on silicon

3. Position Dependent Growth of Polycrystalline Cubic-SiC Film in a Cold-Wall Atmospheric Pressure Chemical Vapour Deposition Reactor

4. Direct CVD Growth of Graphene on Technologically Important Dielectric and Semiconducting Substrates

5. Catalyst-free growth of nanographene films on various substrates

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