Confined Etchant Layer Technique: An Electrochemical Approach to Micro-/Nanomachining-Reference-Cited by-同舟云学术

Confined Etchant Layer Technique: An Electrochemical Approach to Micro-/Nanomachining

Published:2023-07-06 Issue:28 Volume:127 Page:13429-13438
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Han Lianhuan¹^ORCID,Xu Hantao²,Shi Kang²^ORCID,Zhou Jian-Zhang²^ORCID,Yang Fang-Zu²^ORCID,Zhan Dongping²^ORCID,Tian Zhong-Qun²^ORCID,Tian Zhao-Wu²

Affiliation:

1. Department of Mechanical and Electrical Engineering, Pen-Tung Sah Institute of Micro-Nano Science and Technology, Xiamen University, Xiamen 361005, China

2. State Key Laboratory of Physical Chemistry of Solid Surfaces (PCOSS), Engineering Research Center of Electrochemical Technologies of Ministry of Education; Department of Chemistry, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen 361005, China

Funder

National Natural Science Foundation of China

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.3c02985

Reference75 articles.

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2. Gusseff, W. Electrochemical Machining of Metals. British Patent No. 335 003, 1929.

3. Electrochemical Micromachining

4. Recent researches in micro electrical machining

5. Shacham-Diamand, Y.; Osaka, T.; Datta, M.; Ohba, T. Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications; Springer: New York, 2009; pp 100–103.

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