Possible Gas-Phase Reactions of H2/CH4/Tetramethylsilane in Diamond/β-SiC Nanocomposite Film Deposition: An Ab-Initio Study-Reference-Cited by-同舟云学术

Possible Gas-Phase Reactions of H2/CH4/Tetramethylsilane in Diamond/β-SiC Nanocomposite Film Deposition: An Ab-Initio Study

Published:2007-04-19 Issue:18 Volume:111 Page:3554-3559
ISSN:1089-5639
Container-title:The Journal of Physical Chemistry A
language:en
Short-container-title:J. Phys. Chem. A

Author:

Zhao Y. L.¹,Zhang R. Q.¹,Srikanth Vadali. V. S. S.¹,Jiang X.¹

Affiliation:

1. Institute of Material Science and Engineering, Ocean University of China, Qingdao, Shangdong 266100, China, Centre of Super-Diamond and Advanced Films (COSDAF) & Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR, China, and Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Str. 9-11, 57076 Siegen, Germany

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp070014s

Reference31 articles.

1. Investigation of TiN as an interlayer for diamond deposition on steel

2. Adhesion of diamond coatings on steel and copper with a titanium interlayer

3. Chemical vapour deposition of polycrystalline diamond films on high-speed steel

4. Surface modification on 304 SS by plasma-immersed ion implantation to improve the adherence of a CVD diamond film

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