Advancing Semiconducting Polymer Patterning: Analysis and Predictive Modeling of Micropatterns Achieved via Photothermal Lithography-Reference-Cited by-同舟云学术

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Advancing Semiconducting Polymer Patterning: Analysis and Predictive Modeling of Micropatterns Achieved via Photothermal Lithography

Published:2024-09-05 Issue: Volume: Page:
ISSN:2637-6105
Container-title:ACS Applied Polymer Materials
language:en
Short-container-title:ACS Appl. Polym. Mater.

Author:

Jha Meghna¹^ORCID,Mogollon Santiana Joaquin¹,Hong Megan L.²,Vong Emily¹,Ahmadi Shiva³,Manikantan Harishankar¹,Moulé Adam J.¹^ORCID

Affiliation:

1. Department of Chemical Engineering, University of California Davis, Davis, California 95616, United States

2. Department of Material Science and Engineering, University of California Davis, Davis, California 95616, United States

3. Department of Art and Art History, University of California Davis, Davis, California 95616, United States

Funder

National Science Foundation

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsapm.4c01884

Reference37 articles.

1. A case study on modeling and optimizing photolithography stage of semiconductor fabrication process

2. Cycle-time improvements for photolithography process in semiconductor manufacturing

3. Control of lithography in semiconductor manufacturing

4. Photolithography Equipment Market Size, Share & Trends Analysis Report By Process (Ultraviolet UV, Deep Ultraviolet), By Light Source (Mercury Lamp, Fluorine Laser), By Wave Length, By End-users, By Region, And Segment Forecasts; 2023–2030. Report ID: GVR-4–68040–134–2.

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