Effect of Ambient Conditions on Radiation-Induced Chemistries of a Nanocluster Organotin Photoresist for Next-Generation EUV Nanolithography-Reference-Cited by-同舟云学术

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Effect of Ambient Conditions on Radiation-Induced Chemistries of a Nanocluster Organotin Photoresist for Next-Generation EUV Nanolithography

Published:2020-02-25 Issue:3 Volume:3 Page:2266-2277
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Diulus J. Trey¹^ORCID,Frederick Ryan T.¹,Hutchison Danielle C.²,Lyubinetsky Igor¹,Addou Rafik¹,Nyman May²^ORCID,Herman Gregory S.¹²³^ORCID

Affiliation:

1. School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, Oregon 97331, United States

2. Department of Chemistry, Oregon State University, Corvallis, Oregon 97331, United States

3. Department of Physics, Oregon State University, Corvallis, Oregon 97331, United States

Funder

Division of Chemistry

Semiconductor Research Corporation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.9b02387

Reference44 articles.

1. Lithography gets extreme

2. Extreme ultraviolet resist materials for sub-7 nm patterning

3. Molecular organometallic resists for EUV (MORE)

4. Recent advances in non-chemically amplified photoresists for next generation IC technology

5. What We Don’t Know About EUV Exposure Mechanisms

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2. Effect of Free Radicals on Irradiation Chemistry of a Double-Coordination Organotin (Sn ₄ ) Photoresist by Adjusting Alkyl Ligands;CCS Chemistry;2024-08

3. Nano metal-oxygen cluster EUV photoresists and their performance influencing factors;SCIENTIA SINICA Chimica;2024-08-01

4. Advanced lithography materials: From fundamentals to applications;Advances in Colloid and Interface Science;2024-07

5. Tin-oxo nanoclusters for extreme ultraviolet photoresists: Effects of ligands, counterions, and doping;The Journal of Chemical Physics;2024-04-17

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