A Novel Method to Make Boron-Doped Microcrystalline Silicon Thin Films with Optimal Crystalline Volume Fraction for Thin Films Solar Cell Applications-Reference-Cited by-同舟云学术

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A Novel Method to Make Boron-Doped Microcrystalline Silicon Thin Films with Optimal Crystalline Volume Fraction for Thin Films Solar Cell Applications

Published:2014-12-01 Issue:12 Volume:14 Page:9388-9394
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j nanosci nanotechnol

Author:

Shin Chonghoon,Park Jinjoo,Kim Sangho,Park Hyeongsik,Jung Junhee,Bong Sungjae,Lee Youn-Jung,Yi Junsin

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characteristics of a radio frequency magnetized double-ring-shaped hollow cathode plasma source with permanent magnets for high-density hydrogen plasma generation;Vacuum;2021-11

2. Investigation of boron-doped hydrogenated silicon films as a thermo-sensing layer for uncooled microbolometer;Thin Solid Films;2019-11

3. Structure and electrical properties of boron doped hydrogenated mixed-phase silicon films for uncooled microbolometer;Infrared Physics & Technology;2019-01

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