Effects of Al Concentration on Microstructural Characteristics and Electrical Properties of Al-Doped ZnO Thin Films on Si Substrates by Atomic Layer Deposition-Reference-Cited by-同舟云学术

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Effects of Al Concentration on Microstructural Characteristics and Electrical Properties of Al-Doped ZnO Thin Films on Si Substrates by Atomic Layer Deposition

Published:2012-07-01 Issue:7 Volume:12 Page:5598-5603
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j nanosci nanotechnol

Author:

Lee Ju Ho,Lee Jae-Won,Hwang Sooyeon,Kim Sang Yun,Cho Hyung Koun,Lee Jeong Yong,Park Jin-Seong

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

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