Volcaniclastic sedimentation in a closed, marginal rift basin: the case of the Melka Kunture area (upper Awash, Ethiopia)

Author:

Pioli L.1ORCID,Melis R. T.1,Mussi M.2

Affiliation:

1. Dipartimento di Scienze Chimiche e Geologiche, Università di Cagliari, Cittadella di Monserrato, 09042 Monserrato, Italy

2. Dipartimento di Scienze Dell'Antichità, Sapienza Università di Roma, Piazzale Aldo Moro 5, Rome 00185, Italy

Abstract

Abstract The upper Awash runs across a volcano-sedimentary succession dated from the Early to Middle Pleistocene and located on the western margin of the northern portion of the Main Ethiopian Rift. The succession lies above Late Miocene to Pliocene lava flows, domes and large volume ignimbrites. The succession formed within a fluvial system that developed within transversal rift faults. The stratigraphy consists of primary volcanic deposits interbedded with reworked sediments emplaced in a low-energy floodplain developed in a subsiding area. The lower part of the volcaniclastic sequence is dominated by a 1.2 Ma old, low aspect ratio, pyroclastic density current deposit (Kella ignimbrite). This eruption was followed by an eruptive stasis and reorganization of the drainage system. Tephra deposition in the floodplain climaxed again between 0.9 and 0.7 Ma and was associated with extensive tephra reworking. Sedimentation rates significantly decreased after 0.6 myr ago, probably owing to declining volcanic activity. Dynamic interaction between tectonics and volcanic activity created a complex sedimentary environment preserving numerous artefacts (lithic tools), animal and hominin remains. Stratigraphic correlation is based on the interpretation of the basin evolution and has relevance for the reconstruction of the palaeoenvironment and the interpretation of the palaeontological and archaeological data.

Funder

Sapienza Università di Roma

Ministero degli Affari Esteri e della Cooperazione Internazionale

Publisher

Geological Society of London

Subject

Geology,Ocean Engineering,Water Science and Technology

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