The Influence Assessment of Artifact Subspace Reconstruction on the EEG Signal Characteristics

Author:

Plechawska-Wójcik Małgorzata1ORCID,Augustynowicz Paweł2,Kaczorowska Monika1ORCID,Zabielska-Mendyk Emilia2,Zapała Dariusz2ORCID

Affiliation:

1. Department of Computer Science, Lublin University of Technology, 20-618 Lublin, Poland

2. Department of Experimental Psychology, The John Paul II Catholic University of Lublin, 20-950 Lublin, Poland

Abstract

EEG signals may be affected by physiological and non-physiological artifacts hindering the analysis of brain activity. Blind source separation methods such as independent component analysis (ICA) are effective ways of improving signal quality by removing components representing non-brain activity. However, most ICA-based artifact removal strategies have limitations, such as individual differences in visual assessment of components. These limitations might be reduced by introducing automatic selection methods for ICA components. On the other hand, new fully automatic artifact removal methods are developed. One of such method is artifact subspace reconstruction (ASR). ASR is a component-based approach, which can be used automatically and with small calculation requirements. The ASR was originally designed to be run not instead of, but in addition to ICA. We compared two automatic signal quality correction approaches: the approach based only on ICA method and the approach where ASR was applied additionally to ICA and run before the ICA. The case study was based on the analysis of data collected from 10 subjects performing four popular experimental paradigms, including resting-state, visual stimulation and oddball task. Statistical analysis of the signal-to-noise ratio showed a significant difference, but not between ICA and ASR followed by ICA. The results show that both methods provided a signal of similar quality, but they were characterised by different usabilities.

Publisher

MDPI AG

Subject

Fluid Flow and Transfer Processes,Computer Science Applications,Process Chemistry and Technology,General Engineering,Instrumentation,General Materials Science

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