Assembly and Bilayer Liftoff of Periodic Nanostructures with Sub-20 nm Resolution Using Thermal Scanning Probe Lithography

Abstract

The demands for high resolution fabrication processes are ever-increasing, with new and optimized methodologies being highly relevant across several scientific fields. We systematically investigated thermal scanning probe lithography process and detailed how tuning temperature and probe contact time on the sample can optimize patterning and achieve 10 nm resolution. Additionally, we propose a novel fabrication methodology that integrates thermal scanning probe lithography and bilayer liftoff, achieving sub-20 nm resolution of the final metallized structures. Each step of the process, from sample preparation to the final liftoff, is described in detail. We also present a quantitative analysis comparing the accuracy of the lithography process to that of the bilayer liftoff. Finally, we show the feasibility of using thermal scanning probe lithography for the fabrication of photonic devices by validating our work with promising dipole geometries for this field.