Surface-Bound and Volatile Mo Oxides Produced During Oxidation of Single MoS2 Crystals in Air and High Relative Humidity

Abstract

We report on the MoO3 oxides and their derivatives on microscopic 2H MoS2 flakes oxidized in air and high relative humidity at a moderate temperature range below 410 °C. We combine XPS and AFM measurements such as topography, friction, creation of nanoscale ripples and scratches on the MoS2 flakes deposited on Si substrates. We detect MoO3 oxides mostly by measuring selected nanomechanical properties of the MoO3 layer, such as its compressive mechanical stress at the plastic yield. We discuss basal surface coverage of the single MoS2 flakes by the MoO3 oxides. We discuss conditions for appearance of all possible MoO3 oxide derivatives, such as molybdenum(VI) hydroxyoxides and MoO3 hydrates. Our findings agree with an expected mechanistic switch in thermal oxidation in water vapors vs. air.