Effect of Oxygen Content on the Properties of Sputtered TaOx Electrolyte Film in All-Solid-State Electrochromic Devices

Author:

Li JiuyongORCID,Liu Weiming,Wei Youxiu,Yan Yue

Abstract

Tantalum oxide (TaOx) thin films are one of the commonly used solid electrolytes in inorganic all-solid-state electrochromic devices (ECDs). The chemical composition and microstructure of TaOx films have a crucial influence on its electron blocking and ion transport properties in all-solid-state ECDs. In this work, various oxygen flux was used to deposit the TaOx films with different compositions and microstructures by pulsed direct current (p-DC) reactive magnetron sputtering. The structural properties, morphologies, chemical compositions, optical properties, electron blocking, and ionic conductive properties of the TaOx films were systematically investigated. The results show that in a certain range, the higher the oxygen flux, the stronger the ion transport ability of TaOx and the lower the electronic conductivity, which could be attributed to the loose structure and smaller number of oxygen vacancies of the films, respectively. Moreover, an all-solid-state ECD with the multilayer structure of glass/ITO/WO3/Li/TaOx/NiO/ITO was also fabricated by the magnetron sputtering method. The device exhibited excellent comprehensive electrochromic properties including high optical modulation, large coloring efficiency, fast response (especially bleaching process), and good cycle stability.

Funder

BAIMTEC MATERIAL CO., LTD

Publisher

MDPI AG

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3