Affiliation:
1. Graduate School of Engineering, Toyama Prefectural University, Imizu 939-0398, Toyama, Japan
2. Graduate School of Engineering Science, Osaka University, Toyonaka 560-8531, Osaka, Japan
Abstract
This study presents the development of photolithography employing biomass-based resist materials derived from polyglucuronic acid. Traditional resist materials require coating and developing procedures involving organic solvents, whereas our approach enables the use of water-based spin-coating and developing processes. The water-soluble biomass resist material, derived from polyglucuronic acid, exhibited exceptional photosensitivity at an exposure wavelength of 365 nm and a dose of approximately 90 mJ/cm2. We successfully patterned the microstructures, creating 3 µm lines and 6 µm holes. This organic solvent-free coating process underscores its applicability in scenarios such as in the microfabrication on plastic substrates with limited organic solvent tolerance and surface-patterning biomaterials containing cells and culture components.
Funder
Japan Society for the Promotion of Science Bilateral Joint Research Projects
TOBE MAKI Scholarship Foundation
OSG Foundation
Izumi Science and Technology Foundation
Amano Institute of Technology Foundation
Iketani Science and Technology Foundation
Takeuchi Foundation
Amada Foundation
Ogasawara Foundation
Die and Mould Technology Promotion Foundation
Lotte Foundation
KOSE Cosmetology Research Foundation
Hayashi Rheology Memorial Foundation
Student Support Associations of Cooperation Between Industry and Academia 2023
TAU Scholarship 2023
Marubun Research Promotion Foundation 2023
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces