SrTiO3 Thin Films on Dielectric Substrates for Microwave Applications

Author:

Tumarkin Andrey1ORCID,Sapego Eugene1,Gagarin Alexander1ORCID,Bogdan Alexey1,Karamov Artem1,Serenkov Igor2,Sakharov Vladimir2

Affiliation:

1. Department of Physical Electronics and Technology, Saint Petersburg Electrotechnical University “LETI”, 197022 Saint Petersburg, Russia

2. Abram Fedorovich Ioffe Institute of Physics and Technology, Russian Academy of Sciences, 194021 Saint Petersburg, Russia

Abstract

Thin films of strontium titanate, which have nonlinear properties that are promising for microwave applications, were grown on a polycrystalline aluminum oxide substrate using magnetron sputtering and high-temperature annealing. It was shown that the improvement of the film structure with an increase in the deposition temperature was clearly correlated with both an increase in nonlinearity and an improvement in the loss level. A capacitor based on an SrTiO3 film deposited at a deposition temperature of 900 °C and subjected to annealing demonstrated a tunability of 46% with a loss tangent of 0.009–0.014 at a frequency of 2 GHz. This was the first successful attempt to form a planar SrTiO3 capacitor on an alumina substrate, which exhibited a commutation quality factor of above 3000 in the microwave range.

Funder

Ministry of Education and Science of Russian Federation

Publisher

MDPI AG

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces

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